Plasma deposition of silicon nitride films in a radial-flow reactor

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[1] Yoo, Chue-san
[2] Dixon, Anthony G.
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Yoo, Chue-san | 1600年 / 35期
关键词：
Navier Stokes Equations - Nonisothermal Mathematical Models - Plasma Deposition - Plasma Enhanced Chemical Vapor Deposition - Radial Flow Reactors - Silicon Nitride Films;
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