SPUTTER TYPE HF ION SOURCE FOR ION BEAM DEPOSITION APPARATUS.

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作者：
Yamashita, Mutsuo [1 ]
机构：
[1] Osaka Electro-Communication Univ, Neyagawa, Jpn, Osaka Electro-Communication Univ, Neyagawa, Jpn
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| 1600年 / 26期
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24
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