Proximity correction of chemically amplified resists for electron beam lithography

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作者：
Cui, Zh. [1 ]
Prewett, Ph.D. [1 ]
机构：
[1] Rutherford Appleton Lab, Oxon, United Kingdom
来源：
Microelectronic Engineering | 1998年 / 41-42卷
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页码：183 / 186
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