INVESTIGATION OF AMORPHOUS LOW-PRESSURE CHEMICAL-VAPOR-DEPOSITED SILICON FILMS BY ELLIPSOMETRY.

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作者：
Flamme, Bruno
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来源：
Siemens Forschungs- und Entwicklungsberichte/Siemens Research and Development Reports | 1981年 / 10卷 / 01期
关键词：
Compendex;
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摘要：
SEMICONDUCTING FILMS
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页码：48 / 52
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