Thermal stability of W2N film as a diffusion barrier between Al and Si

被引：0
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作者：
Noya, Atsushi [1 ]
Takeyama, Mayumi [1 ]
Sasaki, Katsutaka [1 ]
Aoyagi, Eiji [1 ]
Hiraga, Kenji [1 ]
机构：
[1] Kitami Inst of Technology, Kitami, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 1994年 / 33卷 / 3 A期
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页码：1528 / 1529
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