Thermal stability of W2N film as a diffusion barrier between Al and Si

被引：0
|
作者：
Noya, Atsushi [1 ]
Takeyama, Mayumi [1 ]
Sasaki, Katsutaka [1 ]
Aoyagi, Eiji [1 ]
Hiraga, Kenji [1 ]
机构：
[1] Kitami Inst of Technology, Kitami, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 1994年 / 33卷 / 3 A期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：1528 / 1529
相关论文
共 50 条
  • [1] THERMAL-STABILITY OF W2N FILM AS A DIFFUSION BARRIER BETWEEN AL AND SI
    NOYA, A
    TAKEYAMA, M
    SASAKI, K
    AOYAGI, E
    HIRAGA, K
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1994, 33 (3A): : 1528 - 1529
  • [2] Thermal stability of W2N compound barrier in W/W2N/poly-Si gate electrode configuration
    Noya, A
    Takeyama, MB
    IEICE TRANSACTIONS ON ELECTRONICS, 2003, E86C (11) : 2332 - 2335
  • [3] Thermal and chemical stability of the β-W2N nitride phase
    Mateus, R.
    Sequeira, M. C.
    Porosnicu, C.
    Lungu, C. P.
    Hakola, A.
    Alves, E.
    NUCLEAR MATERIALS AND ENERGY, 2017, 12 : 462 - 467
  • [4] AUGER-ELECTRON SPECTROSCOPY STUDY ON THE THERMAL-STABILITY OF THE AL/AL12W/W2N/SI CONTACT SYSTEM
    TAKEYAMA, M
    SASAKI, K
    NOYA, A
    JOURNAL OF APPLIED PHYSICS, 1993, 73 (01) : 185 - 188
  • [5] Thermal stability of PECVD W-B-N thin film as a diffusion barrier
    Kim, YT
    Kim, DJ
    Lee, CW
    Park, JW
    MULTILEVEL INTERCONNECT TECHNOLOGY, 1997, 3214 : 48 - 56
  • [6] Thermal stability of sputter deposited nanocrystalline W2N/amorphous Si3N4 coatings
    Fu, T.
    Shen, Y. G.
    Zhou, Z. F.
    Li, K. Y.
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2006, 24 (06): : 2094 - 2099
  • [7] Ultrathin W-Si-N as diffusion barrier layer between Cu and Si
    Lu, Hua
    Qu, Xinping
    Wang, Guangwei
    Ru, Guoping
    Li, Bingzong
    Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors, 2003, 24 (06): : 612 - 616
  • [8] THERMAL-STABILITY STUDY OF TIN/TISI2 DIFFUSION BARRIER BETWEEN CU AND N+SI
    CHANG, TS
    WANG, WC
    WANG, LP
    HWANG, JC
    HUANG, FS
    JOURNAL OF APPLIED PHYSICS, 1994, 75 (12) : 7847 - 7865
  • [9] A mechanical study of W and W2N single layers, and W2N/W multilayers
    Maillé, L
    Sant, C
    Aubert, P
    Garnier, P
    MECHANICAL PROPERTIES DERIVED FROM NANOSTRUCTURING MATERIALS, 2003, 778 : 239 - 244
  • [10] The study of Zr-Si-N diffusion barrier and its thermal stability
    Song, ZX
    Ding, L
    Xu, KW
    Cheng, H
    RARE METAL MATERIALS AND ENGINEERING, 2005, 34 (03) : 459 - 462
12345