Plasma and surface diagnostics during plasma-enhanced chemical vapor deposition of SiO2 from SiH4/O2/Ar discharges

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作者：
Han, Sang M. [1 ]
Aydil, Eray S. [1 ]
机构：
[1] Univ of California Santa Barbara, Santa Barbara, United States
来源：
Thin Solid Films | 1996年 / 290-291卷
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页码：427 / 434
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