Mask blanks for extreme ultraviolet lithography: ion beam sputter deposition of low defect density Mo/Si multilayers

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Kearney, P.A.
Moore, C.E.
Tan, S.I.
Vernon, S.P.
Levesque, R.A.
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Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena | 1997年 / 15卷 / 06期
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