Plasma production by m = 0 standing helicon waves

被引：0

作者：

Nisoa, Mudtorlep ^{[1
]}

Sakawa, Youichi ^{[1
]}

Shoji, Tatsuo ^{[1
]}

机构：

[1] Nagoya Univ, Nagoya, Japan

来源：

Japanese Journal of Applied Physics, Part 2: Letters | 2000年 / 39卷 / 5 A期

关键词：

D O I：

10.1143/jjap.39.l429

中图分类号：

学科分类号：

摘要：

Plasma sources

引用

共 50 条

[31] SiO2 etching using M=0 helicon wave plasma
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