Direct Vapor Phase Deposition of Single-Crystal Silicon Bars for Use in Solar Cells.

被引：0

作者：

Giarda, L.

Pizzini, S.

机构：

来源：

Rivista dei combustibili | 1979年 / 33卷 / 3-4期

关键词：

Compendex;

D O I：

暂无

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学科分类号：

摘要：

SEMICONDUCTING SILICON

引用

页码：87 / 92

共 3 条

[1] SiNx double layer antireflection coating by plasma-enhanced chemical vapor deposition for single crystalline silicon solar cells
School of Information and Communication Engineering, Sungkyunkwan University, Suwon, Gyeonggi 440-746, Korea, Republic of
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Jpn. J. Appl. Phys., 8 PART 3
[2] High efficiency silicon solar cells fabricated by catalytic chemical vapor deposition (Cat-CVD) Technology
School of Materials Science, Japan Advanced Institute of Science and Technology, Asahidai, Nomi-shi, Ishikawa 923-1292, Japan
J.Vac. Soc.Japan, 12 (529-534): : 529 - 534
[3] Two-step growth of (0001) ZnO single-crystal layers on (0001) sapphire substrates by halide vapor phase epitaxy
Department of Applied Chemistry, Graduate School of Engineering, Tokyo University of Agriculture and Technology, Koganei, Tokyo 184-8588, Japan
Jpn. J. Appl. Phys., 12