Very low contrast x-ray masks for high resolution printing

被引：0

作者：

Chen, Y. ^{[1
]}

Simon, G. ^{[1
]}

Haghiri-Gosnet, A.M. ^{[1
]}

Manin, L. ^{[1
]}

Launois, H. ^{[1
]}

机构：

[1] Lab de Microstructures et de, Microelectronique, Bagneux, France

来源：

Microelectronic Engineering | 1998年 / 41-42卷

关键词：

Fabrication - Numerical analysis - Synchrotron radiation - X ray lithography;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

We propose a scheme for high resolution soft-contact printing with very low contrast X-ray masks. The scheme is based on the strongly enhanced image contrast due to absorber edge effects. In addition to a numerical analysis, we also investigate the mask fabrication with an absorber thickness of 0.15 μm (W) and the replication with synchrotron radiation of ultra high density features.

引用

页码：275 / 278