CONTINUOUS HARD CHROMIUM PLATING.

被引：0

作者：

Muttilainen, Erkii ^{[1
]}

Korpi, Tapio ^{[1
]}

机构：

[1] Technical Research Cent of Finland,, Metallurgy Lab, Espoo, Finl, Technical Research Cent of Finland, Metallurgy Lab, Espoo, Finl

来源：

Anti-Corrosion Methods and Materials | 1984年 / 31卷 / 10期

关键词：

CHROMIUM COMPOUNDS - Electrolysis - CHROMIUM PLATING - ELECTRODES; ELECTROCHEMICAL;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

A new continuous hard chromium plating process for plating long steel bars has been developed. The process is an application of the reduced pressure method, where the chromium electrolysis takes place in a separated process chamber under a pressure reduction of about 50 kPa. In the method the anodic etching problem is solved by using a suitable geometry for the anode and leakages are eliminated by applying a reduced pressure (about 30-50kPa) in the process space.

引用

页码：14 / 15