Control of x-ray beam fluctuation in synchrotron radiation lithography beamline

被引：0

作者：

Shimano, Hiroki ^{[1
]}

Tanaka, Hirofumi ^{[1
]}

Ozaki, Yoshihiko ^{[1
]}

Marumoto, Kenji ^{[1
]}

机构：

[1] Mitsubishi Electric Corp, Hyogo, Japan

来源：

Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers | 1995年 / 34卷 / 10期

关键词：

Beamline optics - Closed beam distortion - Electron beam monitor - Synchrotron radiation beam position monitor - Synchrotron radiation surface drift correction;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

引用

页码：5856 / 5861