Control of x-ray beam fluctuation in synchrotron radiation lithography beamline

被引：0
|
作者：
Shimano, Hiroki [1 ]
Tanaka, Hirofumi [1 ]
Ozaki, Yoshihiko [1 ]
Marumoto, Kenji [1 ]
机构：
[1] Mitsubishi Electric Corp, Hyogo, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers | 1995年 / 34卷 / 10期
关键词：
Beamline optics - Closed beam distortion - Electron beam monitor - Synchrotron radiation beam position monitor - Synchrotron radiation surface drift correction;
D O I：
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中图分类号：
学科分类号：
摘要：
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页码：5856 / 5861
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