Dynamic shielding during ion bombardment of Ba dispenser cathodes

被引：1
作者：
Gärtner, G. [1 ]
Geittner, P. [1 ]
Raasch, D. [1 ]
Ritz, A. [1 ]
Wiechert, D.U. [1 ]
机构：
[1] Philips Research Laboratories, Weisshausstrasse 2, D-52066, Aachen, Germany
来源：
Applied Surface Science | 1999年 / 146卷 / 01期
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D O I：
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学科分类号：
摘要：
10
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页码：12 / 16
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