机构:
Siemens AG, Munich, West Ger, Siemens AG, Munich, West GerSiemens AG, Munich, West Ger, Siemens AG, Munich, West Ger
Kruehler, W.
[1
]
机构:
[1] Siemens AG, Munich, West Ger, Siemens AG, Munich, West Ger
来源:
Metall
|
1985年
/
39卷
/
08期
关键词:
SILICON AND ALLOYS - Thin Films;
D O I:
暂无
中图分类号:
学科分类号:
摘要:
The article reports recent developments. Basic material parameters like density of states and diffusion length and their importance for conversion efficiency of the cells is discussed. The current status of research is reviewed in the light of design concepts aimed at achieving higher efficiencies and better long life stability.