Complete surface-potential-based fully-depleted silicon-on-insulator metal-oxide-semiconductor field-effect-transistor model for circuit simulation

被引：0

作者：

机构：

[1] Kitamaru, Daisuke

[2] Uetsuji, Yasuhito

[3] Sadachika, Norio

[4] Miura-Mattausch, Mitiko

来源：

Kitamaru, D. | 1600年 / Japan Society of Applied Physics卷 / 43期

关键词：

Computer simulation - Current voltage characteristics - Electric currents - Electric potential - Integrated circuits - Iterative methods - Mathematical models - Poisson distribution - Silicon on insulator technology;

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学科分类号：

摘要：

The circuit simulation model Hiroshima-university STARC IGFET Model silicon-on-insulator (HiSIM-SOI) for the fully depleted SOI metal-oxide- semiconductor field-effect-transistor (MOSFET) is developed based on the surafce-potential description. To include all device features of the SOI-MOSFET explicitly, the surface potential values not only at the SOI surface but also the back side, as well as the bulk back-gate are solved iteratively. The total iteration for the potential calculation requires only about twice as much calculation time as the bulk-MOSFET case, solving ony at the surface. The model reproduces measured I-V characteristics within numerical accuracy, and is proved stable circuit convergence.

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