Microstructure evolution and leakage phenomena of CSD PLZT thin films

被引：0
|
作者：
Fujiki, Mitsushi [1 ]
Cross, Jeffrey S. [1 ]
Tsukada, Mineharu [1 ]
Otani, Seigen [1 ]
Kotaka, Yasutoshi [1 ]
Goto, Yasuyuki [1 ]
Matsuura, Katsuyoshi [2 ]
Ashida, Hiroshi [2 ]
机构：
[1] Mat. and Materials Engineering Lab., Fujitsu Laboratories Ltd., 10-1 Morinosato-Wakamiya, Atsugi, 243-0197, Japan
[2] Adv. Mat. and FeRAM Devmt. Dept., Technology Development Division, Fujitsu Ltd., 4-2 Nishinemoriyama, Kanagasaki-cho, Iwate 029-4593, Japan
来源：
Integrated Ferroelectrics | 1999年 / 26卷 / 01期
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页码：269 / 275
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