Self-consistent particle simulation of radio-frequency CF4 discharge with implementation of all ion-neutral reactive collisions

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J Vac Sci Technol A | / 3 pt 1卷 / 1201期

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[1] Self-consistent particle simulation of radio-frequency CF4 discharge with implementation of all ion-neutral reactive collisions
Denpoh, K
Nanbu, K
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1998, 16 (03): : 1201 - 1206
[2] Self-consistent particle simulation of radio frequency CF4 discharge: Effect of gas pressure
Denpoh, Kazuki, 1600, JJAP, Tokyo, Japan (39):
[3] Self-consistent particle simulation of radio frequency CF4 discharge:: Effect of gas pressure
Denpoh, K
Nanbu, K
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2000, 39 (5A): : 2804 - 2808
[4] Self-consistent simulation of radio-frequency discharge in Ar-SiH4 with strong dust contamination
Schweigert, V
Alexandrov, A
INTERNATIONAL CONFERENCE ON PHENOMENA IN IONIZED GAS, VOL I, PROCEEDINGS, 1999, : 195 - 196
[5] Self-consistent particle modeling of inductively coupled CF4 discharges and radical flow
Takekida, H
Nanbu, K
IEEE TRANSACTIONS ON PLASMA SCIENCE, 2006, 34 (03) : 973 - 983
[6] CONCENTRATION PROFILES OF CF IN A CF4 RADIO-FREQUENCY DISCHARGE VIA LASER-INDUCED FLUORESCENCE AND ACTINOMETRY
CONNER, WT
SAWIN, HH
APPLIED PHYSICS LETTERS, 1992, 60 (05) : 557 - 559
[7] Self-consistent particle simulation of radio frequency SF6 discharges:: Role of ion recombination
Tong, LH
Nanbu, K
VACUUM, 2006, 80 (09) : 1012 - 1015
[8] Self-consistent particle modeling of inductively coupled CF4 plasmas:: Effect of wafer biasing
Takekida, H
Nanbu, K
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2006, 45 (3A): : 1805 - 1812
[9] 2-DIMENSIONAL SELF-CONSISTENT FLUID SIMULATION OF RADIO-FREQUENCY INDUCTIVE SOURCES
DIPESO, G
VAHEDI, V
HEWETT, DW
ROGNLIEN, TD
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1994, 12 (04): : 1387 - 1396
[10] Particle-in-cell/Monte Carlo simulation of a capacitively coupled radio frequency Ar/CF4 discharge:: Effect of gas composition
Georgieva, V
Bogaerts, A
Gijbels, R
JOURNAL OF APPLIED PHYSICS, 2003, 93 (05) : 2369 - 2379

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