Phase-shifting point diffraction interferometer

被引：0

作者：

Medecki, H. ^{[1
]}

Tejnil, E. ^{[1
]}

Goldberg, K.A. ^{[1
]}

Bokor, J. ^{[1
]}

机构：

[1] Lawrence Berkeley Natl Lab, Berkeley, United States

来源：

| 1996年 / Optical Soc of America, Washington, DC, United States卷 / 21期

关键词：

Aberrations - Algorithms - Diffraction - Diffraction gratings - Optical beam splitters - Phase shift - Photolithography - Polynomials - Wavefronts;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

Presented is a novel phase-shifting point diffraction interferometer design that preserves the advantages of the conventional point diffraction interferometer yet permits phase-shifting interferometry capability and significantly higher throughput. This compact, common-path interferometer generates the reference wave front by diffraction from a tiny pinhole and does not require reference surfaces or long coherence lengths. These features make the interferometer useful for accurate wave-front measurement over a wide spectral range. This instrument is being developed for accurate, high-resolution wave-front metrology of optics for extreme-ultraviolet projection lithography near the 13-nm wavelength.

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