Si-H bonding environment in PECVD a-SiOxNy:H thin films

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Lab. Mat. et Procedes Membranaires, UMR 5635, 8 Rue de l'Ecole Normale, 34053 Montpellier Cedex 1, France [1 ]
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J. Eur. Ceram. Soc. | / 15-16卷 / 2029-2032期
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