Use of carbon-free Ta2O5 thin-films as a gate insulator

被引：0
作者：
Devine, R.A.B. [1 ]
Chaneliere, C. [1 ]
Autran, J.L. [1 ]
Balland, B. [1 ]
Paillet, P. [1 ]
Leray, J.L. [1 ]
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[1] France-Telecom - CNET/CNS, Meylan, France
来源：
| / Elsevier Sci B.V., Amsterdam, Netherlands卷 / 36期
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