CMOS-compatible device for fluid density measurements fabricated by sacrificial aluminum etching

被引:0
|
作者
Dept. of Solid State Electronics, Chalmers Univ. of Technol., S-412 96, Göteborg, Sweden [1 ]
不详 [2 ]
机构
来源
Sens Actuators A Phys | / 3卷 / 243-251期
关键词
Number:; -; Acronym:; Sponsor: Bayerisches Staatsministerium für Bildung und Kultus; Wissenschaft und Kunst; 93.0161; Sponsor:;
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
  • [1] A CMOS-compatible device for fluid density measurements fabricated by sacrificial aluminium etching
    Westberg, D
    Paul, O
    Andersson, GI
    Baltes, H
    SENSORS AND ACTUATORS A-PHYSICAL, 1999, 73 (03) : 243 - 251
  • [2] A CMOS-compatible device for fluid density measurement
    Westberg, D
    Paul, O
    Andersson, GI
    Baltes, H
    MEMS 97, PROCEEDINGS - IEEE THE TENTH ANNUAL INTERNATIONAL WORKSHOP ON MICRO ELECTRO MECHANICAL SYSTEMS: AN INVESTIGATION OF MICRO STRUCTURES, SENSORS, ACTUATORS, MACHINES AND ROBOTS, 1997, : 278 - 283
  • [3] A CMOS-compatible fluid density sensor
    Westberg, D
    Paul, O
    Andersson, G
    Baltes, H
    JOURNAL OF MICROMECHANICS AND MICROENGINEERING, 1997, 7 (03) : 253 - 255
  • [4] Hybrid postprocessing etching for CMOS-compatible MEMS
    Tea, NH
    Milanovic, V
    Zincke, CA
    Suehle, JS
    Gaitan, M
    Zaghloul, ME
    Geist, J
    JOURNAL OF MICROELECTROMECHANICAL SYSTEMS, 1997, 6 (04) : 363 - 372
  • [5] Hybrid postprocessing etching for CMOS-compatible MEMS
    GE Medical Systems, Milwaukee, United States
    J Microelectromech Syst, 4 (363-371):
  • [6] Sacrificial aluminum etching for CMOS microstructures
    Paul, O
    Westberg, D
    Hornung, M
    Ziebart, V
    Baltes, H
    MEMS 97, PROCEEDINGS - IEEE THE TENTH ANNUAL INTERNATIONAL WORKSHOP ON MICRO ELECTRO MECHANICAL SYSTEMS: AN INVESTIGATION OF MICRO STRUCTURES, SENSORS, ACTUATORS, MACHINES AND ROBOTS, 1997, : 523 - 528
  • [7] Optomechanical Oscillators Fabricated in a CMOS-compatible Foundry
    Benevides, Rodrigo
    Luiz, Gustavo O.
    Santos, Felipe G. S.
    Wiederhecker, Gustavo S.
    Alegre, Thiago P. Mayer
    2016 CONFERENCE ON LASERS AND ELECTRO-OPTICS (CLEO), 2016,
  • [8] Sacrificial oxide etching compatible with aluminum metallization
    Gennissen, PTJ
    French, PJ
    TRANSDUCERS 97 - 1997 INTERNATIONAL CONFERENCE ON SOLID-STATE SENSORS AND ACTUATORS, DIGEST OF TECHNICAL PAPERS, VOLS 1 AND 2, 1997, : 225 - 228
  • [9] Study of CMOS-compatible Copper Etching for Organic Coating
    Lambert, M.
    Rostam-Khani, P.
    ten Veen, J.
    van Nimwegen, L.
    Frederix, F.
    CLEANING AND SURFACE CONDITIONING TECHNOLOGY IN SEMICONDUCTOR DEVICE MANUFACTURING 11, 2009, 25 (05): : 55 - 62
  • [10] Nanostructured Silicon Photonics Devices Fabricated by CMOS-Compatible Process
    Baba, Toshihiko
    2012 PHOTONICS GLOBAL CONFERENCE (PGC), 2012,