Cleaning model for removal of particles due to laser-induced thermal expansion of substrate surface

被引：0
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作者：
Lu, Yong-Feng [1 ]
Song, Wen-Dong [1 ]
Ye, Kai-Dong [1 ]
Lee, Yuan-Ping [1 ]
Chan, Daniel S.H. [1 ]
Low, Teck-Seng [1 ]
机构：
[1] Natl Univ of Singapore, Singapore, Singapore
来源：
Japanese Journal of Applied Physics, Part 2: Letters | 1997年 / 36卷 / 10 A期
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