Effect of absorption character to the reflectance of 193 nm HfO2/SiO2, Y2O3/SiO2 and Al2O3/SiO2 multilayer thin films

被引：0
|
作者：
Yuan, Jing-Mei [1 ]
Tang, Zhao-Sheng [1 ]
Yi, Kui [1 ]
Shao, Jian-Da [1 ]
Fan, Zheng-Xiu [1 ]
机构：
[1] Ctr. for Optical Thin Film Coatings, Inst. of Optics and Fine Mech., Chinese Acad. of Sci., Shanghai 201800, China
来源：
Zhongguo Jiguang/Chinese Journal of Lasers | 2004年 / 31卷 / 12期
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摘要：
10
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页码：1469 / 1472
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