Auger electron spectroscopy study on the characterization and stability of the Cu9Al4/TiN/Si system

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作者：
Noya, Atsushi [1 ]
Sasaki, Katsutaka [1 ]
机构：
[1] Kitami Inst of Technology, Kitumi, Japan
来源：
Japanese Journal of Applied Physics, Part 2: Letters | 1991年 / 30卷 / 10 A期
关键词：
Diffusion; -; Metallizing; Materials; Spectroscopy; Auger Electron;
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