SHADOW PROJECTION MASK FOR X-RAY, ION AND ELECTRON BEAM LITHOGRAPHY.

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作者：
Greschner, J.
Jaerisch, W.
Kulcke, W.
Nehmiz, P.
Recktenwald, W.
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来源：
IBM technical disclosure bulletin | 1983年 / 26卷 / 7 A期
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