SHADOW PROJECTION MASK FOR X-RAY, ION AND ELECTRON BEAM LITHOGRAPHY.

被引：0
|
作者：
Greschner, J.
Jaerisch, W.
Kulcke, W.
Nehmiz, P.
Recktenwald, W.
机构：
来源：
IBM technical disclosure bulletin | 1983年 / 26卷 / 7 A期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
INTEGRATED CIRCUITS
引用
收藏
相关论文
共 50 条
  • [1] SILICON MEMBRANE MASK BLANKS FOR X-RAY AND ION PROJECTION LITHOGRAPHY
    LOCHEL, B
    CHLEBEK, J
    GRIMM, J
    HUBER, HL
    MACIOSSEK, A
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1990, 29 (11): : 2605 - 2609
  • [2] PRECISION-SUBMICRON-DIMENSIONED MASK FOR X-RAY LITHOGRAPHY.
    Riseman, J.
    1600, (27):
  • [3] Electron beam damage in the SiN membrane of an X-ray lithography mask
    Choi, SS
    Kim, JS
    Chung, HB
    Yoo, HJ
    Kim, BW
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1998, 37 (01): : 360 - 363
  • [4] Electron beam damage in the SiN membrane of an X-ray lithography mask
    Choi, Sang-Soo
    Kim, Jong-Soo
    Chung, Hai Bin
    Yoo, Hyung Joun
    Kim, Bo Woo
    Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers, 1998, 37 (01): : 360 - 363
  • [5] REFLECTION MASK TECHNOLOGY FOR X-RAY PROJECTION LITHOGRAPHY
    HAWRYLUK, AM
    CEGLIO, NM
    GAINES, DP
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1989, 7 (06): : 1702 - 1704
  • [6] X-RAY BEAMLINE SYSTEM FOR X-RAY LITHOGRAPHY.
    Eastman, D.E.
    Grobman, W.D.
    IBM technical disclosure bulletin, 1983, 25 (12): : 6415 - 6416
  • [7] PLASMA SOURCES FOR X-RAY LITHOGRAPHY.
    Nagel, D.J.
    VLSI Electronics, Microstructure Science, 1984, 8 : 137 - 170
  • [8] Wafer Stepper for X-Ray Lithography.
    Vach, W.
    Elektronik-Produktion & Pruftechnik, 1988, (01): : 68 - 70
  • [9] SYNCHROTRON RADIATION X-RAY LITHOGRAPHY.
    Haelbich, R.P.
    Silverman, J.P.
    Warlaumont, J.M.
    Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, 1983, 222 (1-2) : 291 - 301
  • [10] DEVELOPMENT OF A SILICON NITRIDE MASK TECHNOLOGY FOR SYNCHROTRON RADIATION X-RAY LITHOGRAPHY.
    Visser, C.C.G.
    Uglow, J.E.
    Burns, D.W.
    Wells, G.
    Redaelli, R.
    Cerrina, F.
    Guckel, H.
    Nuclear instruments and methods in physics research, 1987, A266 (1-3): : 686 - 690
12345