Photochemical behavior and photochemical acid generation of arylmethylsulfonylbenzenes

被引：0

作者：

机构：

[1] Kawashima, Yuko

[2] Tagaya, Motohiro

[3] Nakagawa, Masaru

[4] Iyoda, Tomokazu

来源：

Kawashima, Y. | 1600年 / Society of Polymer Science期

关键词：

Theoretical; (THR);

D O I：

暂无

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摘要：

We previously developed a novel photosensitive monolayer bearing a 4-(benzylsulfonyl)phenyl moiety as a photoreactive unit leading to photopattern by photolithography. The photosensitive monolayer transforms a monolayer composed of benzenesulfinic acid moiety by ultraviolet light exposure. The transformation causes the monolayer surface to be hydrophilic. To use widely the photopatterned monolayer, the photosensitivity of the monolayer should be improved. In this study, we synthesized 13 types of arylmethylsulfonylbenzenes as model compounds and investigated their photochemical behaviors in 2-propanol by ultraviolet light exposure. The photogeneration of benzenesulfinic acid from the arylmethylsulfonylbenzenes was compared by UV-visible spectral measurement and titration.

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