Atomic force microscopy study of surface roughening of sputter-deposited TiN thin films

被引:0
|
作者
机构
[1] Liu, Z.-J.
[2] Jiang, N.
[3] Shen, Y.G.
[4] 1,Mai, Y.-W.
来源
Liu, Z.-J. | 1600年 / American Institute of Physics Inc.卷 / 92期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
  • [31] Preparation of sputter-deposited Fe-Pd thin films
    Wang, Z
    Iijima, T
    He, G
    Oikawa, K
    Wulff, L
    Sanada, N
    Furuya, Y
    MATERIALS TRANSACTIONS JIM, 2000, 41 (09): : 1139 - 1141
  • [32] Evolution of microstructure and texture in sputter-deposited TiN films for interconnect applications
    Hobbs, A
    Inoue, K
    Nakamura, T
    FUJITSU SCIENTIFIC & TECHNICAL JOURNAL, 1996, 32 (01): : 142 - 150
  • [33] Nanosize structure of sputter-deposited tungsten carbide thin films
    Dubcek, P
    Radic, N
    Bernstorff, S
    Salamon, K
    Milat, O
    FUNCTIONAL NANOMATERIALS FOR OPTOELECTRONICS AND OTHER APPLICATIONS, 2004, 99-100 : 251 - 254
  • [34] Structural properties of sputter-deposited nanocrystalline Ni thin films
    Danisman, Murat
    MATERIALS TESTING, 2022, 64 (09) : 1270 - 1277
  • [35] LASER ENHANCED ADHESION OF SPUTTER-DEPOSITED THIN-FILMS
    PEDRAZA, AJ
    JOURNAL OF METALS, 1988, 40 (07): : A79 - A79
  • [36] Evolution of microstructure and texture in sputter-deposited TiN films for interconnect applications
    Hobbs, A.
    Inoue, K.
    Nakamura, T.
    Fujitsu Scientific and Technical Journal, 1996, 32 (01): : 142 - 150
  • [37] Oxidation and reduction characteristics of sputter-deposited Cu thin films
    Abe, K
    Harada, Y
    Yoshimaru, M
    Onoda, H
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2005, 152 (07) : G577 - G581
  • [38] Direct current magnetron sputter-deposited ZnO thin films
    Hoon, Jian-Wei
    Chan, Kah-Yoong
    Krishnasamy, Jegenathan
    Tou, Teck-Yong
    Knipp, Dietmar
    APPLIED SURFACE SCIENCE, 2011, 257 (07) : 2508 - 2515
  • [39] Nanosize structure of sputter-deposited tungsten carbide thin films
    Dubček, P.
    Radić, N.
    Bernstorff, S.
    Salamon, K.
    Milat, O.
    Diffus Def Data Pt B, 1600, (251-254):
  • [40] Properties of sputter-deposited Fe-Pd thin films
    Wang, Z
    Iijima, T
    He, G
    Takahashi, T
    Oikawa, K
    Furuya, Y
    SMART MATERIALS, 2001, 4234 : 284 - 291