HIGH PERFORMANCE VLSI PHOTOMASK WITH A MOLYBDENUM SILICIDE FILM.

被引：0

作者：

Watakabe, Yaichiro ^{[1
]}

Kato, Tadao ^{[1
]}

机构：

[1] Mitsubishi Electric Corp, Tokyo, Jpn, Mitsubishi Electric Corp, Tokyo, Jpn

来源：

Mitsubishi Electric Advance | 1986年 / 36卷

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摘要：

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页码：23 / 25

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