Modes of propagating light waves in thin films of boron nitride deposited by plasma enhanced chemical vapor deposition

被引:0
|
作者
Boudiombo, J. [1 ]
Baehr, O. [1 ]
Boudrioua, A. [1 ]
Thevenin, P. [1 ]
Loulergue, J.C. [1 ]
Bath, A. [1 ]
机构
[1] Universite de Metz et Supelec, Metz, France
来源
Materials science & engineering. B, Solid-state materials for advanced technology | 1997年 / B46卷 / 1-3期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
13
引用
收藏
页码:96 / 98
相关论文
共 50 条
  • [21] Mechanical properties of boron nitride films prepared by plasma-enhanced chemical vapor deposition
    Yang, HS
    Yoshida, T
    SURFACE & COATINGS TECHNOLOGY, 2005, 200 (1-4) : 984 - 987
  • [22] Boron-doped plasma enhanced chemical vapor deposition of ZnO thin films
    Sun, Jie
    Mourey, Devin A.
    Garg, Diwakar
    Jackson, Thomas N.
    ELECTROCHEMICAL AND SOLID STATE LETTERS, 2008, 11 (05) : D47 - D49
  • [23] Chemical and nanomechanical characteristics of fluorocarbon thin films deposited by using plasma enhanced chemical vapor deposition
    Kim, Nam-Kyun
    Cha, Nam-Goo
    Kim, Kyu-Chae
    Kim, Tae-Gon
    Park, Jin-Goo
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2007, 50 (04) : 1113 - 1118
  • [24] Silicon nitride thin films deposited by electron cyclotron resonance plasma enhanced chemical vapor deposition for micromechanical system applications
    Biasotto, C.
    Diniz, J. A.
    Daltrini, A. M.
    Moshkalev, S. A.
    Monteiro, M. J. R.
    THIN SOLID FILMS, 2008, 516 (21) : 7777 - 7782
  • [25] DEPOSITION OF DIAMOND AND BORON-NITRIDE FILMS BY PLASMA CHEMICAL-VAPOR-DEPOSITION
    ALBELLA, JM
    GOMEZALEIXANDRE, C
    SANCHEZGARRIDO, O
    VAZQUEZ, L
    MARTINEZDUART, JM
    SURFACE & COATINGS TECHNOLOGY, 1995, 70 (2-3) : 163 - 174
  • [26] Organic inorganic thin films deposited from diethoxydimethylsilane by plasma enhanced chemical vapor deposition
    Roualdes, S
    Hovanian, N
    Van der Lee, A
    Berjoan, R
    Durand, J
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 1999, 248 (2-3) : 235 - 246
  • [27] Preparation of cubic boron nitride thin film by the helicon wave plasma enhanced chemical vapor deposition
    Kim, SH
    Kim, IH
    Kim, KS
    APPLIED PHYSICS LETTERS, 1996, 69 (26) : 4023 - 4025
  • [28] Organic/inorganic thin films deposited from diethoxydimethylsilane by plasma enhanced chemical vapor deposition
    Roualdes, Stéphanie
    Hovnanian, Nadine
    Van Der Lee, Arie
    Berjoan, Rene
    Durand, Jean
    Journal of Non-Crystalline Solids, 1999, 248 (02): : 235 - 246
  • [29] Material Structure and Mechanical Properties of Silicon Nitride and Silicon Oxynitride Thin Films Deposited by Plasma Enhanced Chemical Vapor Deposition
    Gan, Zhenghao
    Wang, Changzheng
    Chen, Zhong
    SURFACES, 2018, 1 (01): : 59 - 72
  • [30] THE PROPERTIES OF THE TITANIUM NITRIDE DEPOSITED BY PLASMA ENHANCED CHEMICAL VAPOR-DEPOSITION
    JANG, DH
    KIM, SB
    CHUN, JS
    KIM, JG
    PLASMA SURFACE ENGINEERING, VOLS 1 AND 2, 1989, : 147 - 153