SOI wafer flow process for stencil mask fabrication

被引：0

作者：

Butschke, J. ^{[1
]}

Ehrmann, A. ^{[2
]}

Höfflinger, B. ^{[1
]}

Irmscher, M. ^{[1
]}

Käsmaier, R. ^{[2
]}

Letzkus, F. ^{[1
]}

Löschner, H. ^{[3
]}

Mathuni, J. ^{[2
]}

Reuter, C. ^{[1
]}

Schomburg, C. ^{[1
]}

Springer, R. ^{[1
]}

机构：

[1] Inst. fur Mikroelektronik Stuttgart, Allmandring 30a, 70569 Stuttgart, Germany

[2] Siemens AG, Otto-Hahn-Ring 6, 81739 München, Germany

[3] Ionen Mikrofabrikations Syst. GmbH, Schreygasse 3, 1020 Wien, Austria

来源：

Microelectronic Engineering | 1999年 / 46卷 / 01期

关键词：

D O I：

暂无

中图分类号：

学科分类号：

摘要：

引用

页码：473 / 476

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