SOI wafer flow process for stencil mask fabrication

被引：0
作者：
Butschke, J. [1 ]
Ehrmann, A. [2 ]
Höfflinger, B. [1 ]
Irmscher, M. [1 ]
Käsmaier, R. [2 ]
Letzkus, F. [1 ]
Löschner, H. [3 ]
Mathuni, J. [2 ]
Reuter, C. [1 ]
Schomburg, C. [1 ]
Springer, R. [1 ]
机构：
[1] Inst. fur Mikroelektronik Stuttgart, Allmandring 30a, 70569 Stuttgart, Germany
[2] Siemens AG, Otto-Hahn-Ring 6, 81739 München, Germany
[3] Ionen Mikrofabrikations Syst. GmbH, Schreygasse 3, 1020 Wien, Austria
来源：
Microelectronic Engineering | 1999年 / 46卷 / 01期
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页码：473 / 476
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