Plasma-enchanced chemical vapor deposition of silicon nitride

被引：0

作者：

Kobayashi, Ikunori ^{[1
]}

Ogawa, Tetsu ^{[1
]}

Hotta, Sadayoshi ^{[1
]}

机构：

[1] Matsushita Electric Industrial Co, Ltd, Moriguchi, Japan

来源：

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 1992年 / 31卷 / 2 A期

关键词：

12;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

引用

页码：336 / 342

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