Chemically amplified resists: chemistry and processes

被引：1
|
作者：
Reichmanis, E. [1 ]
Houlihan, F.M. [1 ]
Nalamasu, O. [1 ]
Neenan, T.X. [1 ]
机构：
[1] AT&T Bell Laboratories, Murray Hill, United States
来源：
Advanced Materials for Optics and Electronics | 1994年 / 4卷 / 02期
关键词：
715.1 Electronic Equipment; non-communication - 741.3 Optical Devices and Systems - 801.4 Physical Chemistry - 815.1 Polymeric Materials;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
83
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页码：83 / 93
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