Fabrication of diamond films under high density helium plasma formed by electron cyclotron resonance

被引：0

作者：

机构：

[1] Yuasa, Motokazu

[2] Kawarada, Hiroshi

[3] Wei, Jin

[4] Ma, Jing Sheng

[5] Suzuki, Jun-ichi

[6] Okada, Sigenobu

[7] Hiraki, Akio

来源：

Yuasa, Motokazu | 1600年 / 49期

关键词：

Coatings;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

引用

页码：1 / 3

共 24 条

[11] Effect of bias voltage on the properties of hydrogenated amorphous carbon films fabricated on CoCrMo alloy by electron cyclotron resonance plasma enhance chemical vapor deposition (ECR-PECVD) [J].

Deng, Xingrui ;

Leng, Y. X. ;

Sun, H. ;

Huang, Nan .

PROCEEDING OF THE FOURTH INTERNATIONAL CONFERENCE ON SURFACE AND INTERFACE SCIENCE AND ENGINEERING, 2011, 18

[12] High rate growth of nanocrystalline diamond films using high microwave power and pure nitrogen/methane/hydrogen plasma [J].

Tang, C. J. ;

Fernandes, A. J. S. ;

Granada, Marco ;

Leitao, J. P. ;

Pereira, S. ;

Jiang, X. F. ;

Pinto, J. L. ;

Ye, H. .

VACUUM, 2015, 122 :342-346

[13] Formation of Diamond-Like Carbon Thin Films by Using Surface Discharge Plasma under Atmospheric Pressure [J].

Yasui, Shinji ;

Hamada, Hiroshi .

JAPANESE JOURNAL OF APPLIED PHYSICS, 2013, 52 (11)

[14] The protective properties of ultra-thin diamond like carbon films for high density magnetic storage devices [J].

Zhong, Min ;

Zhang, Chenhui ;

Luo, Jianbin ;

Lu, Xinchun .

APPLIED SURFACE SCIENCE, 2009, 256 (01) :322-328

[15] Characteristic Corrosion Resistance of Nanocrystalline TIN Films Prepared by High Density Plasma Reactive Magnetron Sputtering [J].

Kim, J. H. ;

Kang, C. G. ;

Kim, Y. T. ;

Cheong, W. S. ;

Song, P. K. .

JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, 2013, 13 (07) :4601-4607

[16] Formation of diamond-like carbon thin films using barrier-type surface discharge plasma under atmospheric pressure [J].

Yasui, Shinji ;

Tada, Kazuya ;

Takuwa, Tetsuya .

JAPANESE JOURNAL OF APPLIED PHYSICS, 2016, 55 (01)

[17] Highly homogeneous silica coatings for optical and protective applications deposited by PECVD at room temperature in a planar uniform distributed electron cyclotron resonance plasma reactor. [J].

Rostaing, JC ;

Coeuret, F ;

Pelletier, J ;

Lagarde, T ;

Etemadi, R .

THIN SOLID FILMS, 1995, 270 (1-2) :49-54

[18] Fabrication of ultrahard Q-carbon nanocoatings on AISI 304 and 316 stainless steels and subsequent formation of high-quality diamond films [J].

Joshi, Pratik ;

Gupta, Siddharth ;

Haque, Ariful ;

Narayan, Jagdish .

[19] Tribological behavior of O2 and CF4 plasma post-treated diamond-like carbon films under dry air and in a high relative humidity environment [J].

Jongwannasiri, C. ;

Watanabe, S. .

SURFACE & COATINGS TECHNOLOGY, 2016, 306 :200-204

[20] Gas pressure dependence of composition in Ta-Ti-N films prepared by pulsed high energy density plasma [J].

Feng, Wenran ;

Zhou, Hai ;

Yang, Si-ze .

MATERIALS CHEMISTRY AND PHYSICS, 2010, 124 (01) :287-290

← 1 2 3 →