TANDAR INJECTOR SYSTEM AND ION SOURCES.

被引：0
|
作者：
Gonzalez, M. [1 ]
Professi, O. [1 ]
Tersigni, A. [1 ]
机构：
[1] CNEA, Buenos Aires, Argent, CNEA, Buenos Aires, Argent
来源：
Nuclear instruments and methods in physics research | 1987年 / A268卷 / 2-3期
关键词：
ION SOURCES;
D O I：
暂无
中图分类号：
O53 [等离子体物理学]; O57 [原子核物理学、高能物理学];
学科分类号：
070202 ; 070204 ;
摘要：
The Tandar injector system and ion source consists of a preaccelerator of 330 kV, a 90 degree mE/q**2 equals 17 double focussing inflection magnet, the necessary optics to focus negative ions and three negative ion sources. The authors report progress with negative ion production and future improvements.
引用
收藏
相关论文
共 50 条
  • [21] Plasma ion dynamics and beam formation in electron cyclotron resonance ion sources
    Mascali, D.
    Neri, L.
    Gammino, S.
    Celona, L.
    Ciavola, G.
    Gambino, N.
    Miracoli, R.
    Chikin, S.
    REVIEW OF SCIENTIFIC INSTRUMENTS, 2010, 81 (02):
  • [22] Interconnected High-Voltage Pulsed-Power Converters System Design for H- Ion Sources
    Aguglia, Davide
    IEEE TRANSACTIONS ON PLASMA SCIENCE, 2014, 42 (10) : 3070 - 3076
  • [23] Study of Three Different Types of Plasma Ion Sources
    M.M.ABDELRAHMAN
    H.EL-KHABEARy
    Plasma Science and Technology, 2009, (05) : 604 - 608
  • [24] Development of ion sources from ionic liquids for microfabrication
    Perez-Martinez, Carla
    Guilet, Stephane
    Gogneau, Noelle
    Jegou, Pascale
    Gierak, Jacques
    Lozano, Paulo
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2010, 28 (03): : L25 - L27
  • [25] Ionic liquid ion sources for silicon reactive machining
    Guilet, S.
    Perez-Martinez, C.
    Jegou, P.
    Lozano, P.
    Gierak, J.
    MICROELECTRONIC ENGINEERING, 2011, 88 (08) : 1968 - 1971
  • [26] Study of Three Different Types of Plasma Ion Sources
    Abdelrahman, M. M.
    El-Khabeary, H.
    PLASMA SCIENCE & TECHNOLOGY, 2009, 11 (05) : 604 - 608
  • [27] The ionization length in plasmas with finite temperature ion sources
    Jelic, N.
    Kos, L.
    Tskhakaya, D. D., Sr.
    Duhovnik, J.
    PHYSICS OF PLASMAS, 2009, 16 (12)
  • [28] Targets on superhydrophobic surfaces for laser ablation ion sources
    Renisch, D.
    Beyer, T.
    Blaum, K.
    Block, M.
    Duellmann, Ch. E.
    Eberhardt, K.
    Eibach, M.
    Nagy, Sz.
    Neidherr, D.
    Noertershaeuser, W.
    Smorra, C.
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT, 2012, 676 : 84 - 89
  • [29] Vacuum arc ion sources - A brief historical review
    Brown, IG
    Oks, EM
    IEEE TRANSACTIONS ON PLASMA SCIENCE, 1997, 25 (06) : 1222 - 1228
  • [30] Innovative ion sources for accelerators:: the benefits of the plasma technology
    Gammino, S
    Ciavola, G
    Celona, L
    Torrisi, L
    Andò, L
    Presti, M
    Láska, L
    Krása, J
    Wolowski, J
    CZECHOSLOVAK JOURNAL OF PHYSICS, 2004, 54 : C883 - C888
12345