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Comment on 'line shape, line width, and configuration coordinate diagram of the Cu band (1.21 eV) in InP' [J. Appl. Phys. 78, 5206 (1995)]
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[1]
Line shape, line width, and configuration coordinate diagram of the Cu band (1.21 eV) in InP - Comment
Collan, HK
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0
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机构:
TALLINN TECH UNIV, INST MAT TECHNOL, EE-0026 TALLINN, ESTONIA
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Collan, HK
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Krustok, J
JOURNAL OF APPLIED PHYSICS,
1996,
80
(03)
: 1937
-
1939
[2]
Line shape, line width, and configuration coordinate diagram of the Cu band (1.21 eV) in InP - Reply
Pal, D
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0
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0
Pal, D
Bose, DN
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0
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Bose, DN
JOURNAL OF APPLIED PHYSICS,
1996,
80
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: 1940
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1940
[3]
LINE-SHAPE, LINEWIDTH AND CONFIGURATION COORDINATE DIAGRAM OF THE CU BAND (1.21 EV) IN INP
PAL, D
论文数:
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0
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机构:
Materials Science Center, Semiconductor Division, Indian Institute of Technology
PAL, D
BOSE, DN
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0
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Materials Science Center, Semiconductor Division, Indian Institute of Technology
BOSE, DN
JOURNAL OF APPLIED PHYSICS,
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Reply to 'comment on 'analysis for determining thermal diffusivity from thermal pulse experiments'' [J. Appl. Phys. 78, 6867 (1995)]
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Comment on "Nanohardness of high purity Cu single crystals" [J. Appl. Phys. 107, 043510 (2010)]
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Natl Univ Sci & Technol, Res Inst Microwave & Millimeter Wave Studies, Islamabad 44000, Pakistan
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Zafar, Sajeel
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Natl Univ Sci & Technol, Res Inst Microwave & Millimeter Wave Studies, Islamabad 44000, Pakistan
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Comment on "Growth kinetics of oxides during furnace oxidation of silicon in N2O ambient" [J. Appl. Phys. 78, 2767 (1995)]
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Comment on "Sizing the depth and width of ideal delaminations using modulated photothermal radiometry" [J. Appl. Phys. 131, 085106 (2022)]
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