Plasma enhanced selective area microcrystalline silicon deposition on hydrogenated amorphous silicon: surface modification for controlled nucleation

被引：0
|
作者：
Smith, L.L.
Read, W.W.
Yang, C.S.
Srinivasan, E.
Courtney, C.H.
Lamb, H.H.
Parsons, G.N.
机构：
来源：
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films | 1998年 / 16卷 / 3 pt 1期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [1] Plasma enhanced selective area microcrystalline silicon deposition on hydrogenated amorphous silicon: Surface modification for controlled nucleation
    Smith, LL
    Read, WW
    Yang, CS
    Srinivasan, E
    Courtney, CH
    Lamb, HH
    Parsons, GN
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1998, 16 (03): : 1316 - 1320
  • [2] Origin of area selective plasma enhanced chemical vapor deposition of microcrystalline silicon
    Akiki, Ghewa
    Fregnaux, Mathieu
    Florea, Ileana
    Bulkin, Pavel
    Daineka, Dmitri
    Filonovich, Sergej
    Bouttemy, Muriel
    Johnson, Erik, V
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2021, 39 (01):
  • [3] Solid-phase crystallization of hydrogenated amorphous silicon/hydrogenated microcrystalline silicon bilayers deposited by plasma-enhanced chemical vapor deposition
    Park, CD
    Kim, HY
    Cho, MH
    Jan, KJ
    Lee, JY
    THIN SOLID FILMS, 2000, 359 (02) : 268 - 274
  • [4] THE PLASMA-ENHANCED DEPOSITION OF HYDROGENATED AMORPHOUS-SILICON
    EASTON, BC
    CHAPMAN, JA
    HILL, OF
    POWELL, MJ
    VACUUM, 1984, 34 (3-4) : 371 - 376
  • [5] High rate deposition of stable hydrogenated amorphous silicon in transition from amorphous to microcrystalline silicon
    Hou, GF
    Geng, XH
    Zhang, XD
    Zhao, Y
    Xue, JM
    Ren, HZ
    Sun, H
    Zhang, DK
    Xu, YQ
    AMORPHOUS AND NANOCRYSTALLINE SILICON-BASED FILMS-2003, 2003, 762 : 613 - 618
  • [6] Substrate-thickness Dependence of Hydrogenated Microcrystalline Silicon Nucleation Rate on Amorphous Silicon Layer
    Zuo, Zewen
    Cui, Guanglei
    Wang, Yu
    Wang, Junzhuan
    Pu, Lin
    Shi, Yi
    CHEMICAL VAPOR DEPOSITION, 2013, 19 (10-12) : 363 - 366
  • [7] PLASMA DEPOSITION OF HYDROGENATED AMORPHOUS-SILICON - STUDIES OF THE GROWTH SURFACE
    ABELSON, JR
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1993, 56 (06): : 493 - 512
  • [8] Large area deposition of amorphous and microcrystalline silicon by very high frequency plasma
    Sansonnens, L
    Howling, AA
    Hollenstein, C
    AMORPHOUS AND MICROCRYSTALLINE SILICON TECHNOLOGY-1998, 1998, 507 : 541 - 546
  • [9] Defects in hydrogenated microcrystalline silicon prepared by plasma-enhanced chemical vapour deposition
    Morigaki, K.
    Niikura, C.
    Hikita, H.
    Yamaguchi, M.
    JOURNAL OF APPLIED PHYSICS, 2009, 105 (08)
  • [10] Plasma enhanced chemical vapor deposition of amorphous, polymorphous and microcrystalline silicon films
    Cabarrocas, PRI
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 2000, 266 : 31 - 37
12345