SiO2 etching using M = 0 helicon wave plasma

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作者：
Nogami, Hiroshi
Nakagawa, Yukito
Mashimo, Kimiko
Ogahara, Yoneichi
Tsukada, Tsutomu
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Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers | 1996年 / 35卷 / 4B期
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页码：2477 / 2482
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