共 50 条
- [1] LOW-CARBON INCORPORATION IN METALORGANIC MOLECULAR-BEAM EPITAXY OF GAAS USING DIMETHYLAMINE GALLANE JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1993, 32 (7B): : L1014 - L1016
- [2] Low-temperature GaAs metalorganic chemical vapor deposition using dimethylamine gallane and arsine Yamauchi, Yoshiharu, 1600, (32):
- [3] LOW-TEMPERATURE GAAS METALORGANIC CHEMICAL VAPOR-DEPOSITION USING DIMETHYLAMINE GALLANE AND ARSINE JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1993, 32 (2A): : L160 - L163
- [6] Incorporation efficiency of carbon in GaAs using carbon tetrabromide in solid source molecular beam epitaxy JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2004, 22 (03): : 1017 - 1021
- [8] METALORGANIC MOLECULAR-BEAM EPITAXY OF GAAS AND ALGAAS USING BOTH METAL AND METALORGANIC SOURCES INSTITUTE OF PHYSICS CONFERENCE SERIES, 1990, (106): : 223 - 228
- [10] Low temperature growth of heavily carbon-doped GaAs by metalorganic molecular beam epitaxy with elemental gallium Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 1994, 33 (11): : 6090 - 6094