Raman Analysis of SiGe Films Grown by UHV/CVD

被引：0
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作者：
Zhu, Peiyu [1 ]
Chen, Peiyi [1 ]
Li, Chen [1 ]
Luo, Guangli [1 ]
Jia, Hongyong [1 ]
Liu, Zhinong [1 ]
Qian, Peixin [1 ]
机构：
[1] Institute of Microelectronics, Tsinghua University, 100084 Beijing, China
来源：
Guang Pu Xue Yu Guang Pu Fen Xi/Spectroscopy and Spectral Analysis | 2001年 / 21卷 / 04期
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