The Failure Mechanism of Internal Circuit During ESD Striking a Power to Another Power

被引:0
作者
Liao, Chih-Cherng [1 ,2 ]
Li, Ching-Ho [1 ]
Nidhi, Karuna [3 ]
Chuang, Chieh-Yao
Liao, Hsien-Feng [4 ]
Jou, Yeh-Ning [4 ]
Chen, Ke-Horng [1 ]
Lee, Jian-Hsing [4 ]
机构
[1] Natl Yang Ming Chiao Tung Univ, Inst Elect, Hsinchu 30010, Taiwan
[2] Vanguard Int Semicond Corp, Technol Dev Dept, Hsinchu 30010, Taiwan
[3] Richtek Technol Corp, TD Div, Dept ESD, Hsinchu 30288, Taiwan
[4] Vanguard Int Semicond Corp, Device Engn Div, Dept ESD, Hsinchu 30010, Taiwan
关键词
Electrostatic discharges; Clamps; Transistors; Semiconductor diodes; Pins; Discharges (electric); Photoelectricity; Electrostatic-discharge (ESD); guard-ring; quiescent current; transmission-line pulse (TLP); T-CAD; DESIGN;
D O I
10.1109/TDMR.2024.3467116
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Although power supply stressed with respect to another supply is one test items of the electrostatic-discharge (ESD) qualification. However, a current path still exists that has not been reported earlier. From the failure analysis result, the damage is located at the high-voltage N-Well (HVNW) guard-ring of the zapped power domain. Based on the TCAD simulation, the failure mechanism is identified, and shows good agreement with silicon. It proves that the ESD current can only flow through the internal circuit of the zapped power domain and P+ guard-ring (VSS) to become a quiescent current before the power clamp device turns on. So, the internal circuit of the zapped power domain and P+ guard-ring become a substrate triggering circuit to turn on the parasitic npn bipolar between two different power domains, resulting in most ESD current flowing through HVNW guard-rings to induce the damage.
引用
收藏
页码:472 / 479
页数:8
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