Low-dielectric-constant nonporous fluorocarbon films for interlayer dielectric

被引:0
|
作者
Itoh, Azumi [1 ,2 ]
Inokuchi, Atsutoshi [1 ,3 ]
Yasuda, Seiji [1 ]
Teramoto, Akinobu [1 ]
Goto, Tetsuya [1 ]
Hirayama, Masaki [1 ]
Ohmi, Tadahiro [1 ]
机构
[1] New Industry Creation Hatchery Center, Tohoku University, Sendai 980-8579, Japan
[2] Zeon Corporation, Kawasaki 210-9507, Japan
[3] Tokyo Electron Ltd., Nirasaki, Yamanashi 470-0192, Japan
来源
Japanese Journal of Applied Physics | 2008年 / 47卷 / 4 PART 2期
关键词
Gases;
D O I
暂无
中图分类号
学科分类号
摘要
Journal article (JA)
引用
收藏
页码:2515 / 2520
相关论文
共 50 条
  • [1] Low-dielectric-constant nonporous fluorocarbon films for interlayer dielectric
    Itoh, Azumi
    Inokuchi, Atsutoshi
    Yasuda, Seiji
    Teramoto, Akinobu
    Goto, Tetsuya
    Hirayama, Masaki
    Ohmi, Tadahiro
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2008, 47 (04) : 2515 - 2520
  • [2] Fluorinated Amorphous Carbon as a Low-Dielectric-Constant Interlayer Dielectric
    Kazuhiko Endo
    MRS Bulletin, 1997, 22 : 55 - 58
  • [4] Low-Dielectric-Constant Materials for ULSI Interlayer-Dielectric Applications
    Wei William Lee
    Paul S. Ho
    MRS Bulletin, 1997, 22 : 19 - 27
  • [5] Low-dielectric-constant materials for ULSI interlayer-dielectric applications
    Lee, WW
    Ho, PS
    MRS BULLETIN, 1997, 22 (10) : 19 - 24
  • [6] Low dielectric constant fluorocarbon films
    Lau, KKS
    Gleason, KK
    PLASMA DEPOSITION AND TREATMENT OF POLYMERS, 1999, 544 : 209 - 220
  • [7] Low-Dielectric-Constant Novel Periodic Mesoporous Organosilica Thin Film for Interlayer Dielectric
    Zhang, Jiawei
    Zhang, Guoping
    Sun, Rong
    Lee, S. W. Ricky
    Wong, C. P.
    2016 17TH INTERNATIONAL CONFERENCE ON ELECTRONIC PACKAGING TECHNOLOGY (ICEPT), 2016, : 153 - 156
  • [8] Evaluation of copper ion drift in low-dielectric-constant interlayer films by transient capacitance spectroscopy
    Yoshino, T
    Hata, N
    Kikkawa, T
    MATERIALS, TECHNOLOGY AND RELIABILITY FOR ADVANCED INTERCONNECTS AND LOW-K DIELECTRICS-2003, 2003, 766 : 217 - 222
  • [9] Modeling to Predict Effective Dielectric Constant of Porous Silicon Low-Dielectric-constant Thin Films
    Rahmoun, K.
    Fakiri, S.
    SPECTROSCOPY LETTERS, 2014, 47 (05) : 348 - 355
  • [10] Fluorocarbon plasma etching and profile evolution of porous low-dielectric-constant silica
    Sankaran, A
    Kushner, MJ
    APPLIED PHYSICS LETTERS, 2003, 82 (12) : 1824 - 1826