Electron irradiation-enhanced water and hydrocarbon adsorption in EUV lithography devices

被引：0
|
作者：
Al-Ajlony, A. [1 ]
Kanjilal, A. [1 ,2 ]
Catalfano, M. [1 ]
Harilal, S.S. [1 ]
Hassanein, A. [1 ]
机构：
[1] Center for Materials under Extreme Environment, School of Nuclear Engineering Purdue University, West Lafayette,IN,47907, United States
[2] Department of Physics, School of Natural Sciences, Shiv NadarUniversity, Uttar Pradesh,203207, India
来源：
Applied Surface Science | 2014年 / 289卷
关键词：
Molecules - Electrons - Electron irradiation - Hydrocarbons - Mirrors - Secondary emission - Extreme ultraviolet lithography;
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摘要：
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页码：358 / 365
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