Study of reverse recovery characteristic for 3-kV 600-A 4H-SiC flat package type pn diodes

被引:0
|
作者
Ogata, Syuji [1 ]
Takayama, Daisuke [1 ]
Asano, Katsunori [1 ]
Sugawara, Yoshitaka [1 ]
机构
[1] Kansai Electric Power Company, Japan
关键词
3-kV; 600-A; 4H-SiC flat package type pn diodes have been developed and their reverse recovery characteristics have been investigated. In spite of being pn junction diodes; the developed diodes have a short reverse recovery time of 0.153 μs at room temperature. These diodes have one-tenth lower recovery loss and one-third lower recovery time than those of a commercialized 2.5-kV Si diode in spite of a high blocking voltage. When this diode is used in a PWM inverter; the carrier frequency at which the on-state loss is equal to the switching loss is 1.45 times the Si diode's frequency at 398 K. By using the developed diode; high-voltage high-frequency inverter operation can be realized. © 2007 Wiley Periodicals; Inc;
D O I
暂无
中图分类号
学科分类号
摘要
Journal article (JA)
引用
收藏
页码:10 / 17
相关论文
共 39 条
  • [21] Measurements of breakdown field and forward current stability in 3C-SiC pn junction diodes grown on step-free 4H-SiC
    Neudeck, Philip G.
    Spry, David J.
    Trunek, Andrew J.
    SILICON CARBIDE AND RELATED MATERIALS 2005, PTS 1 AND 2, 2006, 527-529 : 1335 - +
  • [22] Perimeter governed minority carrier lifetimes in 4H-SiC p+n diodes measured by reverse recovery switching transient analysis
    Philip G. Neudeck
    Journal of Electronic Materials, 1998, 27 : 317 - 323
  • [23] Study of 4H-SiC high-voltage bipolar diodes under reverse bias using electrical and OBIC characterization
    Isoird, K
    Lazar, M
    Locatelli, ML
    Raynaud, C
    Planson, D
    Chante, JP
    SILICON CARBIDE AND RELATED MATERIALS 2001, PTS 1 AND 2, PROCEEDINGS, 2002, 389-3 : 1289 - 1292
  • [24] Perimeter governed minority carrier lifetimes in 4H-SiC p+n diodes measured by reverse recovery switching transient analysis
    Neudeck, PG
    JOURNAL OF ELECTRONIC MATERIALS, 1998, 27 (04) : 317 - 323
  • [25] Study of Ni/Al/Au ohmic contacts to p-Type 4H-SiC applied in 600 °C environment
    Lei, Cheng
    Li, Qiang
    Liang, Ting
    Liu, RuiFang
    Li, YongWei
    Zhou, XingJian
    Jia, Pinggang
    Ghaffar, Abdul
    Xiong, JiJun
    JOURNAL OF CRYSTAL GROWTH, 2022, 592
  • [26] 10-kV 4H-SiC Drift Step Recovery Diodes (DSRDs) for Compact High-repetition Rate Nanosecond HV Pulse Generator
    Sun, Ruize
    Zhang, Kenan
    Chen, Wanjun
    Xia, Yun
    Tan, Ji
    Chen, Yunfeng
    Bai, Song
    Zhang, Bo
    PROCEEDINGS OF THE 2020 32ND INTERNATIONAL SYMPOSIUM ON POWER SEMICONDUCTOR DEVICES AND ICS (ISPSD 2020), 2020, : 194 - 197
  • [27] High breakdown field P-type 3C-SiC Schottky diodes grown on step-free 4H-SiC mesas
    Spry, DJ
    Trunek, AJ
    Neudeck, PG
    SILICON CARBIDE AND RELATED MATERIALS 2003, PRTS 1 AND 2, 2004, 457-460 : 1061 - 1064
  • [28] Suppression of Punch-Through Current in 3 kV 4H-SiC Reverse-Blocking MOSFET by Using Highly Doped Drift Layer
    Mori, Seigo
    Aketa, Masatoshi
    Sakaguchi, Takui
    Asahara, Hirokazu
    Nakamura, Takashi
    Kimoto, Tsunenobu
    IEEE JOURNAL OF THE ELECTRON DEVICES SOCIETY, 2018, 6 (01): : 449 - 453
  • [29] Improved reverse recovery characteristics obtained in 4H-SiC double-trench superjunction MOSFET with an integrated p-type Schottky diode
    Kotamraju, Siva
    Vudumula, Pavan
    IET CIRCUITS DEVICES & SYSTEMS, 2020, 14 (08) : 1283 - 1288
  • [30] β-Ga2O3/p-Type 4H-SiC Heterojunction Diodes and Applications to Deep-UV Photodiodes
    Nakagomi, Shinji
    Sakai, Toshihide
    Kikuchi, Kentaro
    Kokubun, Yoshihiro
    PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2019, 216 (05):