Epitaxial growth of Ge graded Si1-x-yGexCy alloy film on Si(100) by chemical vapor deposition

被引：0
|
作者：
Li, Zhibing [1 ]
Wang, Ronghua [1 ]
Han, Ping [1 ]
Li, Xiangyang [2 ]
Gong, Haimei [2 ]
Shi, Yi [1 ]
Zhang, Rong [1 ]
机构：
[1] Key Lab. of Advanced Photonic and Electronic Materials, Department of Physics, Nanjing University, Nanjing 210093, China
[2] Shanghai Institute of Technical Physics, Chinese Academy of Science, Shanghai 200083, China
来源：
Cailiao Yanjiu Xuebao/Chinese Journal of Materials Research | 2006年 / 20卷 / 03期
关键词：
Thin films;
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摘要：
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页码：305 / 308
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