Effect of substrate temperature on the structure and optical properties of the Ta2O5 thin film

被引:0
|
作者
Ma, Ya-Lin [1 ]
Shi, Jian [1 ]
Li, Xu-Cheng [1 ]
Yang, Li-Zhong [1 ]
Deng, Chao-Yong [1 ]
机构
[1] Department of Electronic Science, School of Science, Guizhou University, Guiyang 550025, China
来源
Gongneng Cailiao/Journal of Functional Materials | 2013年 / 44卷 / 23期
关键词
D O I
10.3969/j.issn.1001-9731.2013.23.010
中图分类号
学科分类号
摘要
引用
收藏
页码:3405 / 3407
相关论文
共 50 条
  • [31] Effect of sputtering pressure and rapid thermal annealing on optical properties of Ta2O5 thin films
    周继承
    罗迪恬
    李幼真
    刘正
    TransactionsofNonferrousMetalsSocietyofChina, 2009, 19 (02) : 359 - 363
  • [32] Effect of sputtering pressure and rapid thermal annealing on optical properties of Ta2O5 thin films
    Zhou Ji-cheng
    Luo Di-tian
    Li You-zhen
    Liu Zheng
    TRANSACTIONS OF NONFERROUS METALS SOCIETY OF CHINA, 2009, 19 (02) : 359 - 363
  • [33] Temperature dependences of optical properties, chemical composition, structure, and laser damage in Ta2O5 films
    Xu Cheng
    Yang Shuai
    Zhang Sheng-Hui
    Niu Ji-Nan
    Qiang Ying-Huai
    Liu Jiong-Tian
    Li Da-Wei
    CHINESE PHYSICS B, 2012, 21 (11)
  • [34] Temperature dependences of optical properties,chemical composition,structure,and laser damage in Ta2O5 films
    许程
    杨帅
    张生辉
    牛继南
    强颖怀
    刘炯天
    李大伟
    Chinese Physics B, 2012, (11) : 299 - 307
  • [35] Low crystallization temperature for Ta2O5 thin films
    Lin, J
    Suzuki, T
    Matsunaga, D
    Hieda, K
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2003, 42 (11): : 7023 - 7024
  • [36] In-vacuum measurements of optical scatter versus annealing temperature for amorphous Ta2O5 and TiO2:Ta2O5 thin films
    Capote, Elenna M.
    Gleckl, Amy
    Guerrero, Jazlyn
    Rezac, Michael
    Wright, Robert
    Smith, Joshua R.
    JOURNAL OF THE OPTICAL SOCIETY OF AMERICA A-OPTICS IMAGE SCIENCE AND VISION, 2021, 38 (04) : 534 - 541
  • [37] Low Crystallization Temperature for Ta2O5 Thin Films
    Lin, J.
    Suzuki, T.
    Matsunaga, D.
    Hieda, K.
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 2003, 42 (11): : 7023 - 7024
  • [38] Optimization of Ta2O5 optical thin film deposited by radio frequency magnetron sputtering
    Shakoury, R.
    Willey, Ronald R.
    APPLIED OPTICS, 2016, 55 (20) : 5353 - 5357
  • [39] Interfacial structure of Ta2O5/Si film and photoactivity
    Wu Yan
    Yao Wen-Qing
    Zhu Yong-Fa
    ACTA PHYSICO-CHIMICA SINICA, 2007, 23 (05) : 625 - 629
  • [40] Electrical characteristics of Ti-O/Ta2O5 thin film sputtered on Ta/Ti/Al2O3 substrate
    Kim, HJ
    Song, JS
    Kim, IS
    Kim, SS
    THIN SOLID FILMS, 2004, 446 (01) : 124 - 127