Fabrication of defect-free nanoimprinted photonic crystals for laser applications

被引：0

作者：

Reboud, V. ^{[1
]}

Kehagias, N. ^{[1
]}

Lovera, P. ^{[1
]}

Zelsmann, M. ^{[2
]}

Schuster, C. ^{[3
]}

Reuther, F. ^{[3
]}

Gruetzner, G. ^{[3
]}

Redmond, G. ^{[1
]}

Sotomayor Torres, C.M. ^{[1
,4
,5
]}

机构：

[1] Tyndall National Institute, Lee Maltings, Prospect Row, Cork, Ireland

[2] LTM-CNRS, C/o CEA-LETI, 17 rue des Martyrs, F-38054 Grenoble Cedex 9, France

[3] Micro Resist Technology GmbH, Koepenicker Str. 325, Haus 211, 1255, Berlin, Germany

[4] Catalan Institute of Nanotechnology, Campus de Bellaterra, Edifici CM7, Bellaterra, 08193 Barcelona, Spain

[5] Catalan Institute for Research and Advanced Studies, ICREA, 08010 Barcelona, Spain

来源：

Japanese Journal of Applied Physics | 2008年 / 47卷 / 6 PART 2期

关键词：

Photonic crystals;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

Journal article (JA)

引用

页码：5139 / 5141