Oxidation behavior of γ/Mo2Ni3Si ternary metal silicide alloy

被引：0

作者：

Xu, Y.W. ^{[1
]}

Wang, H.M. ^{[1
]}

机构：

[1] Laboratory of Laser Materials Processing and Manufacturing, School of Materials Science and Engineering, BeiHang University, 37 Xueyuan Road, Beijing, 100083, China

来源：

Journal of Alloys and Compounds | 2008年 / 457卷 / 1-2期

关键词：

The oxidation behavior of Mo2Ni3Si based ternary metal silicide alloy toughened by small amount of nickel-base solid solution (γ) was investigated at 1173 K. The oxide scale was observed to have a duplex structure consisting of a top columnar NiO layer and an internal NiO-SiO2 mixed layer with continuous SiO2 formed at its base. The continuous SiO2 layer made a significant contribution to the low oxidation rate through preventing the diffusion of oxygen and Ni2+. While; the cracks existing in the oxide scale due to growth stress; thermal stress and volatilization of MoO3 provided rapid diffusion paths for oxygen and Ni2+ and deteriorated the alloy's oxidation resistance. © 2007 Elsevier B.V. All rights reserved;

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摘要：

Journal article (JA)

引用

页码：239 / 243

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